Multifunctional magnetron sputtering coating machine technical scheme
Multifunctional magnetron sputtering machine (high vacuum magnetron sputtering instrument) is used to prepare metal, alloy, compound, semiconductor, ceramic, medium composite film and other chemical reaction film by magnetron sputtering method. Suitable for plating all kinds of single layer film, multilayer film, doping film and alloy film; Magnetic and non-magnetic materials can be plated.
Multifunctional magnetron sputtering coater - Key technical features of equipment
Adhering to the idea that the equipment provides the means to realize the process, we have done the following design and engineering implementation, the actual operation effect is good, and provide the precise process equipment solution for the user's special process realization.
Combined treatment of the back of the target and the surface of the sputtering target
- It is difficult for the target and the target surface to make direct surface contact. If the surface contact is not achieved, the contact resistance will increase, resulting in insufficient amplitude of the ionization electric field (the increase of the contact resistance and the increase of the electric field partial pressure of the contact surface), resulting in poor coating effect; The increase of resistance causes the target to heat up and reduce the coating quality.
- Poor contact between the target and the target surface, resulting in poor water cooling effect and reduced coating quality.
- Add a layer of special conductive and soft material to ensure surface contact.
